EFFECT OF HIGH-STRAIN ON NOISE CHARACTERISTICS IN INALAS/INGAAS PSEUDOMORPHIC HEMT

被引:3
作者
CHOUGH, KB
HONG, WP
CANEAU, C
SONG, JI
机构
[1] Bellcore, Red Bank, MJ 07701
关键词
TRANSISTORS; SEMICONDUCTOR MATERIALS AND DEVICES;
D O I
10.1049/el:19921292
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have investigated the RF noise characteristics of an InGaAs HEMT having a highly strained channel. The characteristics were compared with those of a device having a lattice-matched channel. The indium mole fraction of the strained channel was 80%. While the DC and RF performances were significantly improved with the strained channel, the RF noise characteristics showed that the device with the strained channel had higher noise and a different dependence on bias current.
引用
收藏
页码:2016 / 2018
页数:3
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