THE EFFECTIVENESS OF CHROMIUM AND TIW AS DIFFUSION-BARRIERS FOR AUZN/AU CONTACTS IN INP JUNCTION FIELD-EFFECT TRANSISTORS

被引：4

作者：

BOOS, JB ^{[1
]}

KRUPPA, W ^{[1
]}

PAPANICOLAOU, NA ^{[1
]}

机构：

[1] SACHS FREEMAN ASSOCIATES,LANDOVER,MD 20785

来源：

THIN SOLID FILMS | 1988年 / 162卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(88)90204-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：161 / 169

页数：9

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