FORMATION AND STRUCTURE OF EPITAXIAL NICKEL SILICIDE ON SI(111)

被引：55

作者：

YANG, WS

JONA, F

MARCUS, PM

机构：

[1] SUNY STONY BROOK,DEPT MAT SCI,STONY BROOK,NY 11794

[2] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

PHYSICAL REVIEW B | 1983年 / 28卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.28.7377

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：7377 / 7380

页数：4

共 15 条

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