A MECHANISTIC STUDY OF SF6/O2 REACTIVE ION ETCHING OF MOLYBDENUM

被引：24

作者：

PARK, SJ

SUN, CP

PURTELL, RJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 05期

关键词：

D O I：

10.1116/1.583618

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1372 / 1373

页数：2

共 12 条

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[6] MOLYBDENUM TAPER DRY ETCHING [J].

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[7]

IBACH H, 1982, ELECTRON ENERGY LOSS, P347

[8] MOLYBDENUM ETCHING USING CCL4/O2 MIXTURE GAS [J].

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[10]

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