PHYSICAL-PROPERTIES OF SPUTTER-DEPOSITED TITANIUM SILICIDE AS A FUNCTION OF SUBSTRATE-TEMPERATURE

被引:5
作者
TANIELIAN, M
BLACKSTONE, S
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D O I
10.1149/1.2114148
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:1487 / 1491
页数:5
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