INTERFACIAL PROPERTIES OF INP AND PHOSPHORUS DEPOSITED AT LOW-TEMPERATURE

被引:18
作者
SCHACHTER, R
OLEGO, DJ
BAUMANN, JA
BUNZ, LA
RACCAH, PM
SPICER, WE
机构
[1] UNIV ILLINOIS,DEPT PHYS,CHICAGO,IL 60680
[2] STANFORD UNIV,DEPT ELECT ENGN,STANFORD ELECTR LABS,STANFORD,CA 94305
关键词
D O I
10.1063/1.96188
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:272 / 274
页数:3
相关论文
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