MEASUREMENTS OF DIFFUSION-COEFFICIENT OF CF2 RADICAL IN DC PULSED CF4/O-2 DISCHARGE PLASMA

被引：4

作者：

ARAI, T

GOTO, M

TAKAYAMA, D

SHIMIZU, T

MURAKAMI, M

机构：

[1] Department of Electronic and Electrical Engineering, Kanagawa Institute of Technology

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 7B期

关键词：

ETCHING PLASMA; CF2; RADICAL; DIFFUSION COEFFICIENT; CF4/O-2; PLASMA; LASER-INDUCED FLUORESCENCE;

D O I：

10.1143/JJAP.33.4170

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Laser-induced fluorescence has been used to measure the CF2 radical ground-state densities after extinction of DC pulsed CF4/O-2 discharge plasma. From the measurement, the CF2 radical was shown to be removed mainly by a diffusion process. Its diffusion coefficients are found to be D=150 cm(2.)Torr(.)s(-1) in O-2 and D=65 cm(2.)Torr(.)s(-1) in CF4 at room temperature.

引用

收藏

页码：4170 / 4172

页数：3

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