HOLE TRAPS IN SILICON DIOXIDE

被引：118

作者：

WOODS, MH ^{[1
]}

WILLIAMS, R ^{[1
]}

机构：

[1] RCA LABS,PRINCETON,NJ 08540

来源：

关键词：

D O I：

10.1063/1.322730

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1082 / 1089

页数：8

共 31 条

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