LASER-INDUCED FLUORESCENCE STUDY OF CF RADICALS IN CF4/O2 PLASMAS

被引：13

作者：

HANSEN, SG ^{[1
]}

LUCKMAN, G ^{[1
]}

NIEMAN, GC ^{[1
]}

COLSON, SD ^{[1
]}

机构：

[1] YALE UNIV,STERLING CHEM LAB,NEW HAVEN,CT 06511

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 02期

关键词：

D O I：

10.1116/1.584838

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：128 / 130

页数：3

共 21 条

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[9]

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