共 10 条
[1]
ARNELL RD, 1989, 11TH P INT VAC C KOL
[2]
THE FORMATION AND CONTROL OF DIRECT-CURRENT MAGNETRON DISCHARGES FOR THE HIGH-RATE REACTIVE PROCESSING OF THIN-FILMS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1989, 7 (03)
:1230-1234
[3]
KADLEC S, 1989, P ICMC SAN DIEGO
[5]
MONAGHAN D, 1991, IN PRESS THIN SOLID
[8]
CHARGED-PARTICLE FLUXES FROM PLANAR MAGNETRON SPUTTERING SOURCES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1986, 4 (02)
:196-202
[9]
UNBALANCED DC MAGNETRONS AS SOURCES OF HIGH ION FLUXES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1986, 4 (03)
:453-456
[10]
WINDOW B, 1986, J VAC SCI TECHNOL A, V4, P504