STRUCTURAL AND TECHNOLOGICAL PROPERTIES OF HEAVILY INSITU PHOSPHORUS-DOPED LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED SILICON FILMS

被引：10

作者：

BIELLEDASPET, D

MERCADERE, L

BOUKEZZATA, M

PIERAGGI, B

DEMAUDUIT, B

机构：

[1] CNRS,UNITE RECH 445,ECOLE NATL SUPER CHIM TOULOUSE,MET PHYS LAB,F-31062 TOULOUSE,FRANCE

[2] UNIV TOULOUSE 3,CNRS,UNITE RECH 799,MICROSCOPIE & STRUCT MAT LAB,F-31062 TOULOUSE,FRANCE

来源：

THIN SOLID FILMS | 1989年 / 175卷

关键词：

D O I：

10.1016/0040-6090(89)90806-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：43 / 48

页数：6

共 12 条

[1] BIELLEDASPET D, 1987, THIN SOLID FILMS, V150, P60
[2] STRUCTURE AND CRYSTAL-GROWTH OF ATMOSPHERIC AND LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITED SILICON FILMS
BISARO, R
MAGARINO, J
PROUST, N
ZELLAMA, K
[J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (04) : 1167 - 1178
[3] SOLID-PHASE CRYSTALLIZATION KINETICS IN DOPED ALPHA-SI CHEMICAL-VAPOR-DEPOSITION FILMS
BISARO, R
MAGARINO, J
ZELLAMA, K
SQUELARD, S
GERMAIN, P
MORHANGE, JF
[J]. PHYSICAL REVIEW B, 1985, 31 (06): : 3568 - 3575
[4] HARBEKE G, 1983, RCA REV, V44, P287
[5] GROWTH AND PHYSICAL-PROPERTIES OF LPCVD POLYCRYSTALLINE SILICON FILMS
HARBEKE, G
KRAUSBAUER, L
STEIGMEIER, EF
WIDMER, AE
KAPPERT, HF
NEUGEBAUER, G
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (03) : 675 - 682
[6] DEPOSITION AND ELECTRICAL-PROPERTIES OF INSITU PHOSPHORUS-DOPED SILICON FILMS FORMED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION
LEARN, AJ
FOSTER, DW
[J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (05) : 1898 - 1904
[7] THERMAL-OXIDATION OF UNDOPED LPCVD POLYCRYSTALLINE-SILICON FILMS
LU, CY
TSAI, NS
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (02) : 446 - 447
[8] MERCADERE L, 1988, P INT C TRENDS NEW A, P183
[9] PHOSPHORUS-DOPED POLYCRYSTALLINE SILICON VIA LPCVD .1. PROCESS CHARACTERIZATION
MEYERSON, BS
OLBRICHT, W
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (10) : 2361 - 2365
[10] OPTICAL CHARACTERIZATION OF POLYCRYSTALLINE SILICON BEFORE AND AFTER THERMAL-OXIDATION
MONTAUDON, P
DEBROUX, MH
FERRIEU, F
VAREILLE, A
[J]. THIN SOLID FILMS, 1985, 125 (3-4) : 235 - 241

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