ION-INDUCED PHASE FORMATION IN METAL SILICON SYSTEMS

被引：16

作者：

HUNG, LS

MAYER, JW

机构：

[1] Cornell Univ, Dep of Materials, Science & Engineering, Ithaca,, NY, USA, Cornell Univ, Dep of Materials Science & Engineering, Ithaca, NY, USA

来源：

THIN SOLID FILMS | 1985年 / 123卷 / 02期

关键词：

This work is supported in part by the National Science Foundation (L. Toth). Ion implantation was carried out in the National Submicron Facility under partial support of the National Science Foundation;

D O I：

10.1016/0040-6090(85)90015-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：135 / 144

页数：10

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