TITANIUM SILICIDE FORMATION AND ARSENIC DOPANT BEHAVIOR UNDER RAPID THERMAL TREATMENTS IN VACUUM

被引：9

作者：

FURLAN, R

SWART, JW

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 06期

关键词：

D O I：

10.1149/1.2097018

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：1806 / 1811

页数：6

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