ANISOTROPIC ETCHING DURING NEGATIVE-ION RESPUTTERING

被引：3

作者：

MESSIER, R

KESTER, DJ

机构：

来源：

APPLICATIONS OF SURFACE SCIENCE | 1985年 / 22-3卷 / MAY期

关键词：

D O I：

10.1016/0378-5963(85)90042-X

中图分类号：

学科分类号：

摘要：

引用

页码：111 / 117

页数：7

共 10 条

[1]

CUOMO JJ, 1977, IBM J RES DEV, V21, P580, DOI 10.1147/rd.216.0580

[2] SIGNIFICANCE OF NEGATIVE-ION FORMATION IN SPUTTERING AND SIMS ANALYSIS [J].

CUOMO, JJ ;

GAMBINO, RJ ;

HARPER, JME ;

KUPTSIS, JD ;

WEBBER, JC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :281-287

[3] RE-SPUTTERING EFFECTS IN BA(PB, BI)O3 PEROVSKITES [J].

GILBERT, LR ;

MESSIER, R ;

KRISHNASWAMY, SV .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01) :389-391

[4] A CURRENT INSTABILITY IN TIO2 THIN FILM [J].

HADA, T ;

HAYAKAWA, S ;

WASA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1970, 9 (09) :1078-+

[5] EFFECT OF SECONDARY ELECTRONS AND NEGATIVE-IONS ON SPUTTERING OF FILMS [J].

HANAK, JJ ;

PELLICANE, JP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :406-409

[6] MEAN FREE PATH OF NEGATIVE-IONS IN DIODE SPUTTERING [J].

HARPER, JME ;

CUOMO, JJ ;

GAMBINO, RJ ;

KAUFMAN, HR ;

ROBINSON, RS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04) :1597-1600

[7]

Navinsek B., 1976, Progress in Surface Science, V7, P49, DOI 10.1016/0079-6816(76)90001-0

[8] PREPARATION AND PROPERTIES OF RF-SPUTTERED POLYMER METAL THIN-FILMS [J].

ROY, RA ;

MESSIER, R ;

KRISHNASWAMY, SV .

THIN SOLID FILMS, 1983, 109 (01) :27-35

[9] RF SPUTTERING OF SR2NB2O7 [J].

SANETO, A ;

CROSS, LE .

THIN SOLID FILMS, 1980, 66 (03) :351-356

[10] BEHAVIORS OF HIGH-ENERGY ELECTRONS AND NEUTRAL ATOMS IN SPUTTERING OF BATIO3 [J].

SHINTANI, Y ;

NAKANISHI, K ;

TAKAWAKI, T ;

TADA, O .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1975, 14 (12) :1875-1879

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