THE EFFECT OF SHEET RESISTANCE MODIFICATIONS UNDERNEATH THE CONTACT ON THE EXTRACTION OF THE CONTACT RESISTIVITY - APPLICATION TO THE CROSS KELVIN RESISTOR

被引:13
作者
SCORZONI, A
FINETTI, M
机构
[1] CNR, Bologna, Italy, CNR, Bologna, Italy
关键词
ELECTRIC CONDUCTIVITY - Contacts;
D O I
10.1109/16.2466
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The influence of sheet-resistance modifications underneath the contact on the extraction of the contact resistivity is investigated. A generalized scaling theory has been applied to the modeling of the cross Kelvin resistor. It is shown that the errors associated with the contact sheet resistance modification could become appreciable in low-resistance metallizations of interest in VLSI.
引用
收藏
页码:386 / 388
页数:3
相关论文
共 10 条
[1]   CURRENT CROWDING AND MISALIGNMENT EFFECTS AS SOURCES OF ERROR IN CONTACT RESISTIVITY MEASUREMENTS .2. EXPERIMENTAL RESULTS AND COMPUTER-SIMULATION OF SELF-ALIGNED TEST STRUCTURES [J].
CAPPELLETTI, P ;
FINETTI, M ;
SCORZONI, A ;
SUNI, I ;
CIRCELLI, N ;
DALLALIBERA, G .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (03) :532-536
[2]   CONTACT RESISTIVITY OF SILICON SILICIDE STRUCTURES FORMED BY THIN-FILM REACTIONS [J].
FINETTI, M ;
GUERRI, S ;
NEGRINI, P ;
SCORZONI, A ;
SUNI, I .
THIN SOLID FILMS, 1985, 130 (1-2) :37-45
[3]   LATERAL CURRENT CROWDING EFFECTS ON CONTACT RESISTANCE MEASUREMENTS IN 4 TERMINAL RESISTOR TEST PATTERNS [J].
FINETTI, M ;
SCORZONI, A ;
SONCINI, G .
IEEE ELECTRON DEVICE LETTERS, 1984, 5 (12) :524-526
[4]   AN ACCURATE METHOD TO EXTRACT SPECIFIC CONTACT RESISTIVITY USING CROSS-BRIDGE KELVIN RESISTORS [J].
LOH, WM ;
SWIRHUN, SE ;
CRABBE, E ;
SARASWAT, K ;
SWANSON, RM .
IEEE ELECTRON DEVICE LETTERS, 1985, 6 (09) :441-443
[5]   ANALYSIS AND SCALING OF KELVIN RESISTORS FOR EXTRACTION OF SPECIFIC CONTACT RESISTIVITY [J].
LOH, WM ;
SARASWAT, K ;
DUTTON, RW .
IEEE ELECTRON DEVICE LETTERS, 1985, 6 (03) :105-108
[6]   MODELING AND MEASUREMENT OF CONTACT RESISTANCES [J].
LOH, WM ;
SWIRHUN, SE ;
SCHREYER, TA ;
SWANSON, RM ;
SARASWAT, KC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (03) :512-524
[7]   A DIRECT MEASUREMENT OF INTERFACIAL CONTACT RESISTANCE [J].
PROCTOR, SJ ;
LINHOLM, LW .
ELECTRON DEVICE LETTERS, 1982, 3 (10) :294-296
[8]   OBTAINING THE SPECIFIC CONTACT RESISTANCE FROM TRANSMISSION-LINE MODEL MEASUREMENTS [J].
REEVES, GK ;
HARRISON, HB .
ELECTRON DEVICE LETTERS, 1982, 3 (05) :111-113
[9]   A TWO-DIMENSIONAL ANALYTICAL MODEL OF THE CROSS-BRIDGE KELVIN RESISTOR [J].
SCHREYER, TA ;
SARASWAT, KC .
IEEE ELECTRON DEVICE LETTERS, 1986, 7 (12) :661-663
[10]   CURRENT CROWDING AND MISALIGNMENT EFFECTS AS SOURCES OF ERROR IN CONTACT RESISTIVITY MEASUREMENTS .1. COMPUTER-SIMULATION OF CONVENTIONAL CER AND CKR STRUCTURES [J].
SCORZONI, A ;
FINETTI, M ;
GRAHN, K ;
SUNI, I ;
CAPPELLETTI, P .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (03) :525-531