PLASMA DEPOSITION AND CHARACTERIZATION OF THIN SILICON-RICH SILICON-NITRIDE FILMS

被引：31

作者：

NGUYEN, SV

FRIDMANN, S

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 09期

关键词：

D O I：

10.1149/1.2100879

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：2324 / 2329

页数：6

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