SILICON FILMS DEPOSITED FROM SICL4 BY AN RF COLD-PLASMA TECHNIQUE - X-RAY PHOTOELECTRON-SPECTROSCOPY AND ELECTRICAL-CONDUCTIVITY STUDIES

被引：8

作者：

GROSSMAN, E

GRILL, A

POLAK, M

机构：

来源：

THIN SOLID FILMS | 1984年 / 119卷 / 04期

关键词：

D O I：

10.1016/0040-6090(84)90258-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：349 / 356

页数：8

共 20 条

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