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WATER-ABSORPTION AND DENSIFICATION OF PHOSPHOSILICATE GLASS-FILMS
被引:44
作者
:
LEVIN, RM
论文数:
0
引用数:
0
h-index:
0
LEVIN, RM
机构
:
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1982年
/ 129卷
/ 08期
关键词
:
D O I
:
10.1149/1.2124289
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:1765 / 1770
页数:6
相关论文
共 28 条
[1]
EVALUATION OF THE PRISM COUPLER FOR MEASURING THE THICKNESS AND REFRACTIVE-INDEX OF DIELECTRIC FILMS ON SILICON SUBSTRATES
ADAMS, AC
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
ADAMS, AC
SCHINKE, DP
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
SCHINKE, DP
CAPIO, CD
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
CAPIO, CD
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1979,
126
(09)
: 1539
-
1543
[2]
WATER ADSORPTION IN CHEMICALLY VAPOR-DEPOSITED BOROSILICATE GLASS-FILMS
ARAI, E
论文数:
0
引用数:
0
h-index:
0
机构:
NIPPON TELEGRAPH & TEL PUBL CORP,ELECT COMMUN LAB,MIDORI,MUSASHINO,TOKYO,JAPAN
NIPPON TELEGRAPH & TEL PUBL CORP,ELECT COMMUN LAB,MIDORI,MUSASHINO,TOKYO,JAPAN
ARAI, E
TERUNUMA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
NIPPON TELEGRAPH & TEL PUBL CORP,ELECT COMMUN LAB,MIDORI,MUSASHINO,TOKYO,JAPAN
NIPPON TELEGRAPH & TEL PUBL CORP,ELECT COMMUN LAB,MIDORI,MUSASHINO,TOKYO,JAPAN
TERUNUMA, Y
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1974,
121
(05)
: 676
-
681
[3]
DETERMINATION OF PROPERTIES OF FILMS ON SILICON BY METHOD OF ELLIPSOMETRY
ARCHER, RJ
论文数:
0
引用数:
0
h-index:
0
ARCHER, RJ
[J].
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA,
1962,
52
(09)
: 970
-
&
[4]
CORRELATION BETWEEN WATER CONTACT ANGLE AND KPR ADHERENCE ON SIO2 SURFACES
BERGH, AA
论文数:
0
引用数:
0
h-index:
0
BERGH, AA
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1965,
112
(04)
: 457
-
&
[5]
BULK AND SURFACE CONDUCTION IN CVD SIO2 AND PSG PASSIVATION LAYERS
COMIZZOLI, RB
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS, PRINCETON, NJ 08540 USA
RCA LABS, PRINCETON, NJ 08540 USA
COMIZZOLI, RB
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(03)
: 386
-
391
[6]
INFRARED ABSORPTION CHARACTERISTICS OF SOLUBLE AND INSOLUBLE PHOSPHOROUS-BEARING OXIDE LAYERS
CORL, EA
论文数:
0
引用数:
0
h-index:
0
CORL, EA
REESE, WE
论文数:
0
引用数:
0
h-index:
0
REESE, WE
[J].
METALLURGICAL TRANSACTIONS,
1970,
1
(03):
: 747
-
&
[7]
DAGHIR KS, 1972, OCT EL SOC M MIAM BE
[8]
CALCULATION OF DIFFUSION PENETRATION CURVES FOR SURFACE AND GRAIN BOUNDARY DIFFUSION
FISHER, JC
论文数:
0
引用数:
0
h-index:
0
FISHER, JC
[J].
JOURNAL OF APPLIED PHYSICS,
1951,
22
(01)
: 74
-
77
[9]
PROTON AND SODIUM TRANSPORT IN SIO2 FILMS
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1967,
ED14
(11)
: 749
-
+
[10]
WATER CONTAMINATION IN THERMAL OXIDE ON SILICON
HOLMBERG, GL
论文数:
0
引用数:
0
h-index:
0
HOLMBERG, GL
KUPER, AB
论文数:
0
引用数:
0
h-index:
0
KUPER, AB
MIRALDI, FD
论文数:
0
引用数:
0
h-index:
0
MIRALDI, FD
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970,
117
(05)
: 677
-
+
←
1
2
3
→
共 28 条
[1]
EVALUATION OF THE PRISM COUPLER FOR MEASURING THE THICKNESS AND REFRACTIVE-INDEX OF DIELECTRIC FILMS ON SILICON SUBSTRATES
ADAMS, AC
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
ADAMS, AC
SCHINKE, DP
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
SCHINKE, DP
CAPIO, CD
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
CAPIO, CD
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1979,
126
(09)
: 1539
-
1543
[2]
WATER ADSORPTION IN CHEMICALLY VAPOR-DEPOSITED BOROSILICATE GLASS-FILMS
ARAI, E
论文数:
0
引用数:
0
h-index:
0
机构:
NIPPON TELEGRAPH & TEL PUBL CORP,ELECT COMMUN LAB,MIDORI,MUSASHINO,TOKYO,JAPAN
NIPPON TELEGRAPH & TEL PUBL CORP,ELECT COMMUN LAB,MIDORI,MUSASHINO,TOKYO,JAPAN
ARAI, E
TERUNUMA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
NIPPON TELEGRAPH & TEL PUBL CORP,ELECT COMMUN LAB,MIDORI,MUSASHINO,TOKYO,JAPAN
NIPPON TELEGRAPH & TEL PUBL CORP,ELECT COMMUN LAB,MIDORI,MUSASHINO,TOKYO,JAPAN
TERUNUMA, Y
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1974,
121
(05)
: 676
-
681
[3]
DETERMINATION OF PROPERTIES OF FILMS ON SILICON BY METHOD OF ELLIPSOMETRY
ARCHER, RJ
论文数:
0
引用数:
0
h-index:
0
ARCHER, RJ
[J].
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA,
1962,
52
(09)
: 970
-
&
[4]
CORRELATION BETWEEN WATER CONTACT ANGLE AND KPR ADHERENCE ON SIO2 SURFACES
BERGH, AA
论文数:
0
引用数:
0
h-index:
0
BERGH, AA
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1965,
112
(04)
: 457
-
&
[5]
BULK AND SURFACE CONDUCTION IN CVD SIO2 AND PSG PASSIVATION LAYERS
COMIZZOLI, RB
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS, PRINCETON, NJ 08540 USA
RCA LABS, PRINCETON, NJ 08540 USA
COMIZZOLI, RB
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(03)
: 386
-
391
[6]
INFRARED ABSORPTION CHARACTERISTICS OF SOLUBLE AND INSOLUBLE PHOSPHOROUS-BEARING OXIDE LAYERS
CORL, EA
论文数:
0
引用数:
0
h-index:
0
CORL, EA
REESE, WE
论文数:
0
引用数:
0
h-index:
0
REESE, WE
[J].
METALLURGICAL TRANSACTIONS,
1970,
1
(03):
: 747
-
&
[7]
DAGHIR KS, 1972, OCT EL SOC M MIAM BE
[8]
CALCULATION OF DIFFUSION PENETRATION CURVES FOR SURFACE AND GRAIN BOUNDARY DIFFUSION
FISHER, JC
论文数:
0
引用数:
0
h-index:
0
FISHER, JC
[J].
JOURNAL OF APPLIED PHYSICS,
1951,
22
(01)
: 74
-
77
[9]
PROTON AND SODIUM TRANSPORT IN SIO2 FILMS
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1967,
ED14
(11)
: 749
-
+
[10]
WATER CONTAMINATION IN THERMAL OXIDE ON SILICON
HOLMBERG, GL
论文数:
0
引用数:
0
h-index:
0
HOLMBERG, GL
KUPER, AB
论文数:
0
引用数:
0
h-index:
0
KUPER, AB
MIRALDI, FD
论文数:
0
引用数:
0
h-index:
0
MIRALDI, FD
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970,
117
(05)
: 677
-
+
←
1
2
3
→