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WATER-ABSORPTION AND DENSIFICATION OF PHOSPHOSILICATE GLASS-FILMS
被引:44
作者
:
LEVIN, RM
论文数:
0
引用数:
0
h-index:
0
LEVIN, RM
机构
:
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1982年
/ 129卷
/ 08期
关键词
:
D O I
:
10.1149/1.2124289
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:1765 / 1770
页数:6
相关论文
共 28 条
[11]
KERN W, 1976, RCA REV, V37, P55
[12]
CHEMICAL VAPOR DEPOSITION OF SILICATE GLASSES FOR USE WITH SILICON DEVICES .2. FILM PROPERTIES
KERN, W
论文数:
0
引用数:
0
h-index:
0
KERN, W
HEIM, RC
论文数:
0
引用数:
0
h-index:
0
HEIM, RC
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970,
117
(04)
: 568
-
&
[13]
Koelmans H, 1974, 12TH ANN P REL PHYS, P168
[14]
LOW-PRESSURE DEPOSITION OF PHOSPHOSILICATE GLASS-FILMS
LEVIN, RM
论文数:
0
引用数:
0
h-index:
0
LEVIN, RM
ADAMS, AC
论文数:
0
引用数:
0
h-index:
0
ADAMS, AC
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1982,
129
(07)
: 1588
-
1592
[15]
INFLUENCE OF THERMAL SIO2 SURFACE CONSTITUTION ON ADHERENCE OF PHOTORESISTS
LUSSOW, RO
论文数:
0
引用数:
0
h-index:
0
LUSSOW, RO
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(06)
: 660
-
&
[16]
WATER IN SILICA GLASS
MOULSON, AJ
论文数:
0
引用数:
0
h-index:
0
MOULSON, AJ
ROBERTS, JP
论文数:
0
引用数:
0
h-index:
0
ROBERTS, JP
[J].
TRANSACTIONS OF THE FARADAY SOCIETY,
1961,
57
(08):
: 1208
-
&
[17]
INTERACTION BETWEEN PHOSPHOSILICATE GLASS-FILMS AND WATER
NAGASIMA, N
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
NAGASIMA, N
SUZUKI, H
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
SUZUKI, H
TANAKA, K
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
TANAKA, K
NISHIDA, S
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
NISHIDA, S
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1974,
121
(03)
: 434
-
438
[18]
ELECTROCHEMICAL CHARGING OF THERMAL SIO2 FILMS BY INJECTED ELECTRON CURRENTS
NICOLLIA.EH
论文数:
0
引用数:
0
h-index:
0
NICOLLIA.EH
BERGLUND, CN
论文数:
0
引用数:
0
h-index:
0
BERGLUND, CN
SCHMIDT, PF
论文数:
0
引用数:
0
h-index:
0
SCHMIDT, PF
ANDREWS, JM
论文数:
0
引用数:
0
h-index:
0
ANDREWS, JM
[J].
JOURNAL OF APPLIED PHYSICS,
1971,
42
(13)
: 5654
-
&
[19]
PAULSON WM, 1974, 12TH ANN P REL PHYS, P172
[20]
STRUCTURAL EVALUATION OF SILICON OXIDE FILMS
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
PLISKIN, WA
LEHMAN, HS
论文数:
0
引用数:
0
h-index:
0
LEHMAN, HS
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1965,
112
(10)
: 1013
-
&
←
1
2
3
→
共 28 条
[11]
KERN W, 1976, RCA REV, V37, P55
[12]
CHEMICAL VAPOR DEPOSITION OF SILICATE GLASSES FOR USE WITH SILICON DEVICES .2. FILM PROPERTIES
KERN, W
论文数:
0
引用数:
0
h-index:
0
KERN, W
HEIM, RC
论文数:
0
引用数:
0
h-index:
0
HEIM, RC
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970,
117
(04)
: 568
-
&
[13]
Koelmans H, 1974, 12TH ANN P REL PHYS, P168
[14]
LOW-PRESSURE DEPOSITION OF PHOSPHOSILICATE GLASS-FILMS
LEVIN, RM
论文数:
0
引用数:
0
h-index:
0
LEVIN, RM
ADAMS, AC
论文数:
0
引用数:
0
h-index:
0
ADAMS, AC
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1982,
129
(07)
: 1588
-
1592
[15]
INFLUENCE OF THERMAL SIO2 SURFACE CONSTITUTION ON ADHERENCE OF PHOTORESISTS
LUSSOW, RO
论文数:
0
引用数:
0
h-index:
0
LUSSOW, RO
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(06)
: 660
-
&
[16]
WATER IN SILICA GLASS
MOULSON, AJ
论文数:
0
引用数:
0
h-index:
0
MOULSON, AJ
ROBERTS, JP
论文数:
0
引用数:
0
h-index:
0
ROBERTS, JP
[J].
TRANSACTIONS OF THE FARADAY SOCIETY,
1961,
57
(08):
: 1208
-
&
[17]
INTERACTION BETWEEN PHOSPHOSILICATE GLASS-FILMS AND WATER
NAGASIMA, N
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
NAGASIMA, N
SUZUKI, H
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
SUZUKI, H
TANAKA, K
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
TANAKA, K
NISHIDA, S
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
HITACHI LTD,SEMICOND & INTEGRATED CIRCUITS DIV,KODAIRA,TOKYO,JAPAN
NISHIDA, S
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1974,
121
(03)
: 434
-
438
[18]
ELECTROCHEMICAL CHARGING OF THERMAL SIO2 FILMS BY INJECTED ELECTRON CURRENTS
NICOLLIA.EH
论文数:
0
引用数:
0
h-index:
0
NICOLLIA.EH
BERGLUND, CN
论文数:
0
引用数:
0
h-index:
0
BERGLUND, CN
SCHMIDT, PF
论文数:
0
引用数:
0
h-index:
0
SCHMIDT, PF
ANDREWS, JM
论文数:
0
引用数:
0
h-index:
0
ANDREWS, JM
[J].
JOURNAL OF APPLIED PHYSICS,
1971,
42
(13)
: 5654
-
&
[19]
PAULSON WM, 1974, 12TH ANN P REL PHYS, P172
[20]
STRUCTURAL EVALUATION OF SILICON OXIDE FILMS
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
PLISKIN, WA
LEHMAN, HS
论文数:
0
引用数:
0
h-index:
0
LEHMAN, HS
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1965,
112
(10)
: 1013
-
&
←
1
2
3
→