AN INTRINSIC STRESS SCALING LAW FOR POLYCRYSTALLINE THIN-FILMS PREPARED BY ION-BEAM SPUTTERING

被引：359

作者：

WINDISCHMANN, H

机构：

来源：

关键词：

D O I：

10.1063/1.339560

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1800 / 1807

页数：8

共 47 条

[1] Andersen H. H., 1981, Sputtering by particle bombardment I. Physical sputtering of single-element solids, P145
[2] HEAVY-ION SPUTTERING YIELDS OF GOLD - FURTHER EVIDENCE OF NONLINEAR EFFECTS
ANDERSEN, HH
BAY, HL
[J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (06) : 2416 - 2422
[3] Bottiger J., 1971, Radiation Effects, V11, P69, DOI 10.1080/00337577108230451
[4] RAMAN SPECTRA OF ALN CUBIC BN AND BP
BRAFMAN, O
LENGYEL, G
MITRA, SS
GIELISSE, PJ
PLENDL, JN
MANSUR, LC
[J]. SOLID STATE COMMUNICATIONS, 1968, 6 (08) : 523 - &
[5] BRANDES EA, 1983, SMITHELLS METALS REF, pCH15
[6] CAMPBELL DS, 1970, HDB THIN FILM TECHNO, pCH2
[7] CHAUHARI P, 1976, J VAC SCI TECHNOL, V9, P520
[8] OPTICAL-PROPERTIES OF DENSE THIN-FILM SI AND GE PREPARED BY ION-BEAM SPUTTERING
COLLINS, RW
WINDISCHMANN, H
CAVESE, JM
GONZALEZHERNANDEZ, J
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (02) : 954 - 957
[9] MODIFICATION OF NIOBIUM FILM STRESS BY LOW-ENERGY ION-BOMBARDMENT DURING DEPOSITION
CUOMO, JJ
HARPER, JME
GUARNIERI, CR
YEE, DS
ATTANASIO, LJ
ANGILELLO, J
WU, CT
HAMMOND, RH
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 349 - 354
[10] ALUMINUM FILMS DEPOSITED BY RF SPUTTERING
DHEURLE, FM
[J]. METALLURGICAL TRANSACTIONS, 1970, 1 (03): : 725 - &