AN INTRINSIC STRESS SCALING LAW FOR POLYCRYSTALLINE THIN-FILMS PREPARED BY ION-BEAM SPUTTERING

被引：359

作者：

WINDISCHMANN, H

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 05期

关键词：

D O I：

10.1063/1.339560

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1800 / 1807

页数：8

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共 47 条

[21] DEPENDENCE OF MAGNETIC-PROPERTIES OF CO-PT FILMS ON SPUTTERING CONDITIONS
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[22] EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THE X-RAY MICROSTRUCTURE OF THIN SILVER FILMS
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[23] ON THE INTRINSIC STRESS IN THIN CHROMIUM FILMS
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[24] ELASTICITY MODULUS-EF AND TEMPERATURE EXPANSION COEFFICIENT-ALPHA-F OF ALUMINUM THIN-FILMS MEASURED BY A NEW METHOD
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[J]. THIN SOLID FILMS, 1984, 112 (03) : 219 - 225
[25] EFFECT OF ENERGETIC NEUTRALIZED NOBLE-GAS IONS ON THE STRUCTURE OF ION-BEAM SPUTTERED THIN METAL-FILMS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (01): : 44 - 51
[26] COMPUTER-SIMULATION OF AMORPHOUS THIN-FILMS OF HARD SPHERES
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[J]. THIN SOLID FILMS, 1977, 47 (02) : 155 - 158
[27] MECHANICAL-PROPERTIES AND DETERIORATION OF MGF2 THIN-FILMS
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[J]. THIN SOLID FILMS, 1982, 89 (02) : 125 - 129
[28] INTRINSIC STRESS IN EVAPORATED METAL FILMS
KLOKHOLM, E
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 138 - &
[29] INTRINSIC STRESS IN EVAPORATED METAL FILMS
KLOKHOLM, E
BERRY, BS
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (08) : 823 - &
[30] CORRELATION BETWEEN THE STRESS AND MICROSTRUCTURE IN BIAS-SPUTTERED ZRO2-Y2O3 FILMS
KNOLL, RW
BRADLEY, ER
[J]. THIN SOLID FILMS, 1984, 117 (03) : 201 - 210

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