CORRELATION BETWEEN THE STRESS AND MICROSTRUCTURE IN BIAS-SPUTTERED ZRO2-Y2O3 FILMS

被引：38

作者：

KNOLL, RW

BRADLEY, ER

机构：

来源：

THIN SOLID FILMS | 1984年 / 117卷 / 03期

关键词：

D O I：

10.1016/0040-6090(84)90287-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：201 / 210

页数：10

共 21 条

[1] EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS
BLAND, RD
KOMINIAK, GJ
MATTOX, DM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 671 - 674
[2] INFLUENCE OF ION-BOMBARDMENT ON MICROSTRUCTURE OF THICK DEPOSITS PRODUCED BY HIGH RATE PHYSICAL VAPOR-DEPOSITION PROCESSES
BUNSHAH, RF
JUNTZ, RS
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1404 - &
[3] Campbell DS, 1970, HDB THIN FILM TECHNO
[4] STUDY OF CALCIA-STABILIZED ZIRCONIA THIN-FILM SENSORS
CROSET, M
SCHNELL, P
VELASCO, G
SIEJKA, J
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (03): : 777 - 781
[5] COMPOSITION, STRUCTURE, AND AC CONDUCTIVITY OF RF-SPUTTERED CALCIA-STABILIZED ZIRCONIA THIN-FILMS
CROSET, M
SCHNELL, JP
VELASCO, G
SIEJKA, J
[J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (02) : 775 - 780
[6] MODIFICATION OF NIOBIUM FILM STRESS BY LOW-ENERGY ION-BOMBARDMENT DURING DEPOSITION
CUOMO, JJ
HARPER, JME
GUARNIERI, CR
YEE, DS
ATTANASIO, LJ
ANGILELLO, J
WU, CT
HAMMOND, RH
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 349 - 354
[7] MORPHOLOGICAL AND ELECTRICAL PROPERTIES OF RF SPUTTERED Y2O3-DOPED ZRO2 THIN-FILMS
GREENE, JE
WICKERSHAM, CE
ZILKO, JL
WELSH, LB
SZOFRAN, FR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 72 - 75
[8] GREENE JE, 1977, J VAC SCI TECHNOL, V14, P177, DOI 10.1116/1.569116
[9] Hoffmann RW., 1976, PHYS NONMETALLIC THI, P273, DOI [10.1007/978-1-4684-0847-8_12, DOI 10.1007/978-1-4684-0847-8_12]
[10] KNOLL RW, 1983, UNPUB NOV P MAT RES

← 1 2 3 →