THE ROLE OF METAL AND PASSIVATION DEFECTS IN ELECTROMIGRATION-INDUCED DAMAGE IN THIN-FILM CONDUCTORS

被引：37

作者：

LLOYD, JR

SMITH, PM

PROKOP, GS

机构：

来源：

THIN SOLID FILMS | 1982年 / 93卷 / 3-4期

关键词：

D O I：

10.1016/0040-6090(82)90144-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：385 / 395

页数：11

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