MEASUREMENT OF STRESS GRADIENTS GENERATED BY ELECTROMIGRATION

被引：119

作者：

BLECH, IA ^{[1
]}

TAI, KL ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

APPLIED PHYSICS LETTERS | 1977年 / 30卷 / 08期

关键词：

D O I：

10.1063/1.89414

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：387 / 389

页数：3

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共 12 条

[1] X-RAY-DIFFRACTION TOPOGRAPHS OF SILICON CRYSTALS WITH SUPERPOSED OXIDE FILM .3. INTENSITY DISTRIBUTION
ANDO, Y
PATEL, JR
KATO, N
[J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (10) : 4405 - 4412
[2] STRESS GENERATION BY ELECTROMIGRATION
BLECH, IA
HERRING, C
[J]. APPLIED PHYSICS LETTERS, 1976, 29 (03) : 131 - 133
[3] ELECTROMIGRATION IN THIN ALUMINUM FILMS ON TITANIUM NITRIDE
BLECH, IA
[J]. JOURNAL OF APPLIED PHYSICS, 1976, 47 (04) : 1203 - 1208
[4] GRAIN-BOUNDARY SOLUTE ELECTROMIGRATION IN POLYCRYSTALLINE FILMS
HO, PS
HOWARD, JK
[J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (08) : 3229 - 3233
[5] HOFFMAN RW, 1966, PHYSICS THIN FILMS, V3
[6] DIFFUSIVITY AND SOLUBILITY OF SI IN AL METALLIZATION OF INTEGRATED CIRCUITS
MCCALDIN, JO
SANKUR, H
[J]. APPLIED PHYSICS LETTERS, 1971, 19 (12) : 524 - &
[7] X-RAY EXTINCTION CONTRAST TOPOGRAPHY OF SILICON STRAINED BY THIN SURFACE FILMS
MEIERAN, ES
BLECH, IA
[J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (10) : 3162 - &
[8] CURRENT-INDUCED MASS TRANSPORT IN ALUMINUM
PENNEY, RV
[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1964, 25 (03) : 335 - &
[9] HEAT CAPACITY AND RESISTANCE MEASUREMENTS FOR ALUMINUM AND LEAD WIRES
POCHAPSKY, TE
[J]. ACTA METALLURGICA, 1953, 1 (06): : 747 - 751
[10] SCHWUTTKE GH, 1966, J APPL PHYS, V39, P1581