INTERSTITIAL INTERACTIONS - ARSENIC-ALUMINUM, PHOSPHORUS-ALUMINUM PUSH EFFECT

Quantum chemical calculations on a model silicon lattice where the interstitial n-type dopants, arsenic and phosphorus, interact with the interstitial p-type dopants, aluminum and boron, yield net system energies in a sequence outlined by the authors. This sequence indicates that the interstitial boron-phosporus pair will repulse each other while the boron-arsenic pair will not. This is consistent with the emitter push effect. However, when aluminum replaces boron the predicted behavior is that a push efect should be observed when either interstitial arsenic or phosphorus is present. The effect should be more pronounced in the aluminum-arsenic case.