MICROLITHOGRAPHIC BEHAVIOR OF TRANSITION-METAL OXIDE RESISTS EXPOSED TO FOCUSED ION-BEAM

被引：11

作者：

KOSHIDA, N ^{[1
]}

ICHINOSE, Y ^{[1
]}

OHTAKA, K ^{[1
]}

KOMURO, M ^{[1
]}

ATODA, N ^{[1
]}

机构：

[1] ELECTROTECH LAB,SAKURA,IBARAKI 305,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 05期

关键词：

D O I：

10.1116/1.584922

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1093 / 1096

页数：4

共 20 条

[1] A NEW INORGANIC ELECTRON RESIST USING AMORPHOUS WO-3 FILM [J].

BABA, M ;

IKEDA, T .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (02) :L149-L152

[2] LITHOGRAPHIC PROPERTIES OF AMORPHOUS WO3 FILMS EXPOSED TO PHOTONS, ELECTRONS, AND HYDROGEN PLASMA [J].

GUPTA, PK ;

CHOPRA, KL .

JOURNAL OF APPLIED PHYSICS, 1987, 62 (10) :4273-4276

[3] ION-BEAM EXPOSURE CHARACTERISTICS OF RESISTS - EXPERIMENTAL RESULTS [J].

HALL, TM ;

WAGNER, A ;

THOMPSON, LF .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (06) :3997-4010

[4] EFFECT OF KILOVOLT ELECTRONS ON ETCH RATE OF AL2O3 AND TA2O5 [J].

HILL, BH .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (05) :668-&

[5] FE2O3 - INORGANIC ELECTRON RESIST MATERIAL [J].

KAMMLOTT, GW ;

SINCLAIR, WR .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (07) :929-932

[6] ION RESIST PROPERTIES OF THIN-FILMS OF TRANSITION-METAL OXIDES [J].

KOSHIDA, N ;

ICHINOSE, Y ;

OHTAKA, K .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 39 (1-4) :736-738

[7] OBSERVATION OF AN INSULATOR-METAL TRANSITION WITH NA+-IRRADIATED AMORPHOUS MOO3 FILMS [J].

KOSHIDA, N ;

IKETSU, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (09) :1596-1597

[8] ION-BEAM MODIFICATION OF AMORPHOUS WO3 FILM AND ITS PROPERTIES AS A HIGH-CONTRAST INORGANIC-ION RESIST [J].

KOSHIDA, N ;

TOMITA, O .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1985, 24 (01) :92-94

[9] MECHANISM OF A HIGH-CONTRAST INORGANIC-ION RESIST USING AMORPHOUS WO3 [J].

KOSHIDA, N ;

TOMITA, O .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1986, 25 (12) :1932-1935

[10] FOCUSED ION-BEAM LITHOGRAPHY WITH TRANSITION-METAL OXIDE RESISTS [J].

KOSHIDA, N ;

OHTAKA, K ;

ANDO, M ;

KOMURO, M ;

ATODA, N .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (10) :2090-2094

← 1 2 →