MICROWAVE-DISCHARGE PLASMA OXIDATION OF SILICON IN A CUSP MAGNETIC-FIELD

被引：11

作者：

KIMURA, S

MURAKAMI, E

WARABISAKO, T

SUNAMI, H

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 08期

关键词：

D O I：

10.1149/1.2096197

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2009 / 2012

页数：4

共 14 条

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[10] LOW-TEMPERATURE OXIDATION OF SILICON IN A MICROWAVE-DISCHARGED OXYGEN PLASMA [J].

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