BILAYER SILICIDE FORMATION DURING THE INTERACTION OF THIN CHROMIUM, NICKEL AND PLATINUM FILMS WITH SILICON

被引:7
作者
NAUDE, MO [1 ]
PRETORIUS, R [1 ]
MARAIS, DJ [1 ]
机构
[1] UNIV STELLENBOSCH,DEPT PHYS,DIV SOLID STATE,STELLENBOSCH 7600,SOUTH AFRICA
关键词
D O I
10.1016/0040-6090(82)90306-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:339 / 348
页数:10
相关论文
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