SOME RECENT TRENDS IN THE PREPARATION OF THIN-LAYERS BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION

被引：18

作者：

HITCHMAN, ML

AHMED, W

机构：

[1] UNIV SALFORD,DEPT CHEM & APPL CHEM,SALFORD M5 4WT,LANCS,ENGLAND

[2] UNIV SALFORD,THIN FILM & SURFACE RES CTR,SALFORD M5 4WT,LANCS,ENGLAND

来源：

VACUUM | 1984年 / 34卷 / 10-1期

关键词：

We gratefullya cknowledgea grant from the SERC and a CASE studentshipin conjunctionw ith GEC Hirst ResearchC entref or WA;

D O I：

10.1016/0042-207X(84)90182-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：979 / 986

页数：8

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