ION ASSISTED DEPOSITION OF OXYNITRIDES OF ALUMINUM AND SILICON

被引：18

作者：

ALJUMAILY, GA ^{[1
]}

MOONEY, TA ^{[1
]}

SPURGEON, WA ^{[1
]}

DAUPLAISE, HM ^{[1
]}

机构：

[1] USA,MAT TECHNOL LAB,WATERTOWN,MA 02172

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.575928

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2280 / 2285

页数：6

共 13 条

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[4]

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APPLIED OPTICS, 1987, 26 (13) :2621-2624

[7] ENHANCED GOLD FILM BONDING BY ION-ASSISTED DEPOSITION [J].

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SAINTY, WG ;

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[8] ION-BEAM-ASSISTED DEPOSITION OF THIN-FILMS [J].

MARTIN, PJ ;

MACLEOD, HA ;

NETTERFIELD, RP ;

PACEY, CG ;

SAINTY, WG .

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[9] ION-BEAM APPLICATIONS FOR PRECISION INFRARED OPTICS [J].

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HERRMANN, WC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :324-326

[10] PREPARATION, CHARACTERIZATION AND APPLICATIONS OF SILICON-NITRIDE THIN-FILMS [J].

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