NICKEL CHROMIUM INTERFACE RESOLUTION IN AUGER DEPTH PROFILES

被引：36

作者：

MITCHELL, DF

SPROULE, GI

机构：

来源：

SURFACE SCIENCE | 1986年 / 177卷 / 01期

关键词：

D O I：

10.1016/0039-6028(86)90271-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：238 / 252

页数：15

共 19 条

[1] DEPTH RESOLUTION OF SPUTTER PROFILING
ANDERSEN, HH
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[2] BENNINGHOVEN A, 1971, Z PHYS, V230, P403
[3] Blattner R. J., 1979, Surface and Interface Analysis, V1, P32, DOI 10.1002/sia.740010107
[4] SPUTTER PROFILING THROUGH NI-FE INTERFACES BY AUGER-ELECTRON SPECTROSCOPY
CHUANG, TJ
WANDELT, K
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1978, 22 (03) : 277 - 284
[5] SPUTTER-INDUCED ROUGHNESS IN THERMAL SIO2 DURING AUGER SPUTTER PROFILING STUDIES OF THE SI-SIO2 INTERFACE
COOK, CF
HELMS, CR
FOX, DC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01): : 44 - 46
[6] INTERFACE DEPTH RESOLUTION OF AUGER SPUTTER PROFILED NI/CR INTERFACES - DEPENDENCE ON ION-BOMBARDMENT PARAMETERS
FINE, J
LINDFORS, PA
GORMAN, ME
GERLACH, RL
NAVINSEK, B
MITCHELL, DF
CHAMBERS, GP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1985, 3 (03): : 1413 - 1417
[7] DEPTH-PROFILING OF CU-NI SANDWICH SAMPLES BY SECONDARY ION MASS-SPECTROMETRY
HOFER, WO
LIEBL, H
[J]. APPLIED PHYSICS, 1975, 8 (04): : 359 - 360
[8] APPLICATION OF AUGER DEPTH PROFILING ON THE AL-SIO2 INTERFACE
JUNG, T
TITEL, W
[J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1982, 74 (01): : 85 - 90
[9] RECOIL MIXING IN SOLIDS BY ENERGETIC ION-BEAMS
LITTMARK, U
HOFER, WO
[J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3): : 329 - 342
[10] INFLUENCE OF ION-BOMBARDMENT ON DEPTH RESOLUTION IN AUGER-ELECTRON SPECTROSCOPY ANALYSIS OF THIN GOLD-FILMS ON NICKEL
MATHIEU, HJ
MCCLURE, DE
LANDOLT, D
[J]. THIN SOLID FILMS, 1976, 38 (03) : 281 - 294

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