GA VACANCY-ASSISTED DIFFUSION OF SI IN GAAS

被引:6
作者
KAHEN, KB
机构
关键词
D O I
10.1063/1.343602
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:6176 / 6178
页数:3
相关论文
共 11 条
[1]   SI-DEFECT CONCENTRATIONS IN HEAVILY SI-DOPED GAAS - ANNEALING-INDUCED CHANGES-II [J].
CHEN, RT ;
SPITZER, WG .
JOURNAL OF ELECTRONIC MATERIALS, 1981, 10 (06) :1085-1129
[2]   BACKGROUND DOPING DEPENDENCE OF SILICON DIFFUSION IN P-TYPE GAAS [J].
DEPPE, DG ;
HOLONYAK, N ;
KISH, FA ;
BAKER, JE .
APPLIED PHYSICS LETTERS, 1987, 50 (15) :998-1000
[3]   SENSITIVITY OF SI DIFFUSION IN GAAS TO COLUMN-IV AND COLUMN-VI DONOR SPECIES [J].
DEPPE, DG ;
HOLONYAK, N ;
BAKER, JE .
APPLIED PHYSICS LETTERS, 1988, 52 (02) :129-131
[4]  
GILES MD, 1986, MATER RES SOC S P, V69, P323
[5]   DIFFUSION OF SILICON IN GALLIUM-ARSENIDE USING RAPID THERMAL-PROCESSING - EXPERIMENT AND MODEL [J].
GREINER, ME ;
GIBBONS, JF .
APPLIED PHYSICS LETTERS, 1984, 44 (08) :750-752
[6]   DIFFUSION AND ELECTRICAL-PROPERTIES OF SILICON-DOPED GALLIUM-ARSENIDE [J].
GREINER, ME ;
GIBBONS, JF .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (12) :5181-5191
[7]   PROPERTIES OF GA VACANCIES IN ALGAAS MATERIALS [J].
KAHEN, KB ;
PETERSON, DL ;
RAJESWARAN, G ;
LAWRENCE, DJ .
APPLIED PHYSICS LETTERS, 1989, 55 (07) :651-653
[8]   SILICON DIFFUSION AT POLYCRYSTALLINE-SI/GAAS INTERFACES [J].
KAVANAGH, KL ;
MAYER, JW ;
MAGEE, CW ;
SHEETS, J ;
TONG, J ;
WOODALL, JM .
APPLIED PHYSICS LETTERS, 1985, 47 (11) :1208-1210
[9]  
RAJESWARAN G, COMMUNICATION
[10]   CHEMICAL INTERACTIONS AMONG DEFECTS IN GERMANIUM AND SILICON [J].
REISS, H ;
FULLER, CS ;
MORIN, FJ .
BELL SYSTEM TECHNICAL JOURNAL, 1956, 35 (03) :535-636