MINORITY-CARRIER LIFETIME IN FURNACE AND E-BEAM ANNEALED CZ SILICON

被引:10
作者
SUSI, E [1 ]
LULLI, G [1 ]
PASSARI, L [1 ]
机构
[1] IST FIS,GRP NAZI STRUTTURA MAT,GNSM,FERRARA,ITALY
关键词
D O I
10.1149/1.2100649
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
20
引用
收藏
页码:1239 / 1243
页数:5
相关论文
共 21 条
[1]  
BULLIS WM, 1983, ELECTROCHEMICAL SOC
[2]  
CHENG LJ, 1985, DEC MRS FALL M BOST, P424
[3]   THE EFFECT OF PRE-HEAT-TREATMENTS ON THE FORMATION KINETICS OF THERMAL DONORS IN SILICON [J].
GAWORZEWSKI, P ;
HILD, E .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1985, 92 (01) :129-135
[4]   OXYGEN DONOR FORMATION AND OXYGEN PRECIPITATION IN CZOCHRALSKI SILICON DUE TO HEAT-TREATMENT AT 600 TO 800-DEGREES-C [J].
GAWORZEWSKI, P ;
HILD, E ;
SCHMALZ, K .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1985, 90 (02) :K151-K156
[5]   EFFECT OF CARBON ON THE MINORITY-CARRIER LIFETIME IN HEAT-TREATED OXYGEN-CONTAINING SILICON [J].
GLINCHUK, KD ;
LITOVCHENKO, NM ;
SALNIK, ZA ;
SKRYL, SI ;
TROSHIN, AL .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1985, 87 (02) :K149-K152
[6]   THE PROPERTIES OF IRON IN SILICON [J].
GRAFF, K ;
PIEPER, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) :669-674
[7]  
GRAFF K, 1977, ELECTROCHEMICAL SOC, P571
[8]  
HUFF HR, 1981, ELECTROCHEMICAL SOC
[9]   RECOMBINATION LIFETIME IN OXYGEN-PRECIPITATED SILICON [J].
HWANG, JM ;
SCHRODER, DK ;
GOODMAN, AM .
IEEE ELECTRON DEVICE LETTERS, 1986, 7 (03) :172-174
[10]   ELECTRON-BEAM ANNEALING OF SEMICONDUCTORS BY MEANS OF A SPECIFICALLY DESIGNED ELECTRON-GUN [J].
LULLI, G ;
MERLI, PG .
MATERIALS CHEMISTRY AND PHYSICS, 1983, 9 (1-3) :285-294