PLASMA DEPOSITION OF SIO2 GATE INSULATORS FOR ALPHA-SI THIN-FILM TRANSISTORS

被引：10

作者：

DRESNER, J

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 02期

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D O I：

10.1116/1.584062

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

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页码：517 / 523

页数：7

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