REACTION OF AMORPHOUS NI-W AND NI-N-W FILMS WITH SUBSTRATE SILICON

被引：25

作者：

ZHU, MF

SUNI, I

NICOLET, MA

SANDS, T

机构：

[1] CALTECH,PASADENA,CA 91125

[2] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,DIV MAT & MOLEC RES,BERKELEY,CA 94720

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 10期

关键词：

D O I：

10.1063/1.333804

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：2740 / 2745

页数：6

相关论文

共 14 条

[1] SOLID-STATE REACTIONS OF TA-W THIN-FILMS AND SI SINGLE-CRYSTALS
APPELBAUM, A
EIZENBERG, M
BRENER, R
[J]. VACUUM, 1983, 33 (04) : 227 - 230
[2] GROWTH KINETICS OBSERVED IN FORMATION OF METAL SILICIDES ON SILICON
BOWER, RW
MAYER, JW
[J]. APPLIED PHYSICS LETTERS, 1972, 20 (09) : 359 - &
[3] FORMATION OF NI AND PT SILICIDE 1ST PHASE - DOMINANT ROLE OF REACTION-KINETICS
CANALI, C
CATELLANI, F
OTTAVIANI, G
PRUDENZIATI, M
[J]. APPLIED PHYSICS LETTERS, 1978, 33 (02) : 187 - 190
[4] ELECTRICAL CHARACTERISTICS OF AMORPHOUS MOLYBDENUM-NICKEL CONTACTS TO SILICON
KUNG, KTY
SUNI, I
NICOLET, MA
[J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (10) : 3882 - 3885
[5] SILICIDE FORMATION WITH PD-V ALLOYS AND BILAYERS
MAYER, JW
LAU, SS
TU, KN
[J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (09) : 5855 - 5859
[6] NELSON CW, 1969, 1969 P INT S HYBR MI, P413
[7] OERTEL B, 1972, THIN SOLID FILMS, V37, P359
[8] PHASE-SEPARATION IN ALLOY-SI INTERACTION
OTTAVIANI, G
TU, KN
MAYER, JW
TSAUR, BY
[J]. APPLIED PHYSICS LETTERS, 1980, 36 (04) : 331 - 333
[9] Samsonov G. V., 1967, SOV PHYS-TECH PHYS, V1, P695
[10] STABILITY OF AMORPHOUS FE-W ALLOYS IN MULTILAYER METALLIZATIONS ON SILICON
SUNI, I
NICOLET, MA
PAI, CS
LAU, SS
[J]. THIN SOLID FILMS, 1983, 107 (01) : 73 - 80