METAL-FILM DEPOSITION BY GAS-PHASE LASER PYROLYSIS OF NICKEL TETRACARBONYL

被引:26
作者
JERVIS, TR
机构
关键词
D O I
10.1063/1.336114
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1400 / 1401
页数:2
相关论文
共 7 条
[1]   LASER CHEMICAL VAPOR-DEPOSITION OF SELECTED AREA FE AND W FILMS [J].
ALLEN, SD ;
TRINGUBO, AB .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (03) :1641-1643
[2]   HYDROGENATED AMORPHOUS-SILICON GROWTH BY CO2-LASER PHOTO-DISSOCIATION OF SILANE [J].
BILENCHI, R ;
GIANINONI, I ;
MUSCI, M .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (09) :6479-6481
[3]   ULTRAFINE METAL-PARTICLE FORMATION VIA PULSED LASER BREAKDOWN OF CARBONYL VAPORS [J].
DRAPER, CW .
METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE, 1980, 11 (02) :349-351
[4]  
EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P969, DOI 10.1116/1.582718
[5]   ELECTRICAL CHARACTERISTICS OF AMORPHOUS MOLYBDENUM-NICKEL CONTACTS TO SILICON [J].
KUNG, KTY ;
SUNI, I ;
NICOLET, MA .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (10) :3882-3885
[6]   HYDROGENATED AMORPHOUS-SILICON PRODUCED BY LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF SILANE [J].
MEUNIER, M ;
GATTUSO, TR ;
ADLER, D ;
HAGGERTY, JS .
APPLIED PHYSICS LETTERS, 1983, 43 (03) :273-275
[7]   PHOTODEPOSITION OF ALUMINUM-OXIDE AND ALUMINUM THIN-FILMS [J].
SOLANKI, R ;
RITCHIE, WH ;
COLLINS, GJ .
APPLIED PHYSICS LETTERS, 1983, 43 (05) :454-456