GEOMETRICAL FACTORS OF ARGON INCORPORATION IN SIO2-FILMS DEPOSITED BY ION-BEAM SPUTTERING

被引：21

作者：

MOTOHIRO, T

TAGA, Y

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(84)90245-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：313 / 327

页数：15

共 56 条

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