共 17 条
[1]
INFLUENCE OF CHLORINE IMPLANTATION ON PHOSPHORUS DIFFUSIVITY AND OXIDATION-INDUCED DEFECTS IN SILICON
[J].
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH,
1985, 87 (01)
:207-216
[4]
EFFECT OF DIFFUSE-SCATTERING IN THE STRAIN PROFILE DETERMINATION BY DOUBLE CRYSTAL X-RAY-DIFFRACTION
[J].
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH,
1985, 87 (01)
:225-233
[6]
PREDEPOSITION THROUGH A POLYSILICON LAYER AS A TOOL TO REDUCE ANOMALIES IN PHOSPHORUS PROFILES AND THE PUSH-OUT EFFECT IN N-P-N TRANSISTORS
[J].
IEE PROCEEDINGS-I COMMUNICATIONS SPEECH AND VISION,
1980, 127 (01)
:37-41
[8]
GARULLI A, 1983, ULTRAMICROSCOPY, V12, P106
[9]
Gosele U., 1983, Defects in Semiconductors II, Symposium Proceedings, P45