KINETIC PROCESSES OF NF3 ETCHANT GAS-DISCHARGES

被引：57

作者：

GREENBERG, KE ^{[1
]}

VERDEYEN, JT ^{[1
]}

机构：

[1] UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 05期

关键词：

D O I：

10.1063/1.334477

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1596 / 1601

页数：6

共 10 条

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[7] COMPARISON OF THE ETCHING AND PLASMA CHARACTERISTICS OF DISCHARGES IN CF4 AND NF3 [J].

IANNO, NJ ;

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[8]

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[9] SENSITIVE, NONINTRUSIVE, INSITU MEASUREMENT OF TEMPORALLY AND SPATIALLY RESOLVED PLASMA ELECTRIC-FIELDS [J].

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