ON LOW-TEMPERATURE ION-BEAM MIXING OF THIN MARKERS IN NICKEL

[1] DEPTH RESOLUTION OF SPUTTER PROFILING [J]. APPLIED PHYSICS, 1979, 18 (02): : 131 - 140

[2] BOTTIGER J, UNPUB

[3] GUNTHERODT HG, 1983, TOPICS APPLIED PHYSI, V53

[4] INSITU RUTHERFORD BACKSCATTERING MEASUREMENTS OF ION-BEAM-INDUCED ATOMIC MIXING [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3): : 703 - 706

[5] ION MIXING [J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1983, 13 : 339 - 362

[6] ION BEAM MIXING IN AMORPHOUS SILICON - 1. EXPERIMENTAL INVESTIGATION. [J]. Nuclear instruments and methods, 1981, 182 /183 (pt 1): : 43 - 51

[7] ION-BEAM-INDUCED REACTIONS IN METAL-SEMICONDUCTOR AND METAL-METAL THIN-FILM STRUCTURES [J]. NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR): : 1 - 13

[8] THEORETICAL ASPECTS OF ATOMIC MIXING BY ION-BEAMS [J]. NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR): : 25 - 41

[9] MECHANISM OF ION-BEAM INDUCED MIXING OF LAYERED SOLIDS [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1983, 30 (01): : 43 - 46

[1] DEPTH RESOLUTION OF SPUTTER PROFILING [J]. APPLIED PHYSICS, 1979, 18 (02): : 131 - 140

[2] BOTTIGER J, UNPUB

[3] GUNTHERODT HG, 1983, TOPICS APPLIED PHYSI, V53

[4] INSITU RUTHERFORD BACKSCATTERING MEASUREMENTS OF ION-BEAM-INDUCED ATOMIC MIXING [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3): : 703 - 706

[5] ION MIXING [J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1983, 13 : 339 - 362

[6] ION BEAM MIXING IN AMORPHOUS SILICON - 1. EXPERIMENTAL INVESTIGATION. [J]. Nuclear instruments and methods, 1981, 182 /183 (pt 1): : 43 - 51

[7] ION-BEAM-INDUCED REACTIONS IN METAL-SEMICONDUCTOR AND METAL-METAL THIN-FILM STRUCTURES [J]. NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR): : 1 - 13

[8] THEORETICAL ASPECTS OF ATOMIC MIXING BY ION-BEAMS [J]. NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR): : 25 - 41

[9] MECHANISM OF ION-BEAM INDUCED MIXING OF LAYERED SOLIDS [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1983, 30 (01): : 43 - 46