STRESS IN CHEMICAL-VAPOR-DEPOSITED SIO2 AND PLASMA-SINX FILMS ON GAAS AND SI

被引：55

作者：

BLAAUW, C

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来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 09期

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D O I：

10.1063/1.332779

中图分类号：

O59 [应用物理学];

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页码：5064 / 5068

页数：5

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