EFFECT OF HYDROGEN ON DISORDER IN AMORPHOUS-SILICON

被引:8
作者
JACKSON, WB
TSAI, CC
DOLAND, C
机构
[1] Xerox Palo Alto Research Center, Palo Alto, CA, 94304
来源
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 1991年 / 64卷 / 05期
关键词
D O I
10.1080/13642819108217885
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work the effects of posthydrogenation on amorphous silicon network disorder are investigated. The bond angle distribution as determined from Raman linewidths actually increased slightly when the H concentration was increased from 0.2 to 7 at.% rather than decreasing as expected. The H appears to introduce compressive stress on a number of bonds. Furthermore, H incorporation did not significantly alter the band-tail state density either. The H bonding in a-Si does not decrease the number of weak bonds significantly.
引用
收藏
页码:611 / 622
页数:12
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