EFFECTS OF OXYGEN-PRESSURE IN REACTIVE ION-BEAM SPUTTER DEPOSITION OF ZIRCONIUM-OXIDES

被引：27

作者：

YOSHITAKE, M

TAKIGUCHI, K

SUZUKI, Y

OGAWA, S

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 04期

关键词：

D O I：

10.1116/1.575584

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2326 / 2332

页数：7

共 11 条

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