PRODUCTION AND CHARACTERIZATION OF PULSED LARGE-AREA HOMOGENOUS ELECTRON-BEAMS

被引：6

作者：

DANNA, E ^{[1
]}

LEGGIERI, G ^{[1
]}

LUCHES, A ^{[1
]}

NASSISI, V ^{[1
]}

PERRONE, A ^{[1
]}

PERRONE, MR ^{[1
]}

SIMMINI, R ^{[1
]}

机构：

[1] IST NAZL FIS NUCL,BARI,ITALY

来源：

VACUUM | 1985年 / 35卷 / 01期

关键词：

D O I：

10.1016/0042-207X(85)90071-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：19 / 23

页数：5

共 12 条

[1] HEAT-FLOW TRANSIENTS IN SI/PT SYSTEMS [J].

DANNA, E ;

LEGGIERI, G ;

LUCHES, A ;

NAVA, F .

THIN SOLID FILMS, 1983, 110 (01) :83-92

[2]

FLETCHER RC, 1949, PHYS REV, V76, P861

[3] PULSED ELECTRON-BEAM PROCESSING OF MATERIAL-SURFACES [J].

GREENWALD, AC ;

KIRKPATRICK, AR ;

LITTLE, RG ;

MINNUCCI, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1838-1839

[4]

KIRKPATRICK AR, 1977, IEEE T ELECTRON DEVI, V24, P439

[5] PULSED ELECTRON-BEAM FOR SILICON ANNEALING [J].

LEGGIERI, G ;

LUCHES, A ;

NASSISI, V ;

PERRONE, A ;

PERRONE, MR ;

MAJNI, G ;

NAVA, F .

VACUUM, 1982, 32 (01) :9-10

[6] LARGE-AREA FIELD-EMISSION DIODE FOR SEMICONDUCTOR ANNEALING [J].

LUCHES, A ;

NASSISI, V ;

PERRONE, A ;

PERRONE, MR .

PHYSICA B & C, 1981, 104 (1-2) :228-232

[7] ELECTRON-BEAM INDUCED REACTIONS IN METAL SI SYSTEMS [J].

MAJNI, G ;

NAVA, F ;

OTTAVIANI, G ;

LUCHES, A ;

NASSISI, V ;

CELOTTI, G .

VACUUM, 1982, 32 (01) :11-18

[8] MEGAGRAY DOSIMETRY (OR MONITORING OF VERY LARGE RADIATION-DOSES) [J].

MCLAUGHLIN, WL ;

URIBE, RM ;

MILLER, A .

RADIATION PHYSICS AND CHEMISTRY, 1983, 22 (3-5) :333-362

[9] DIAGNOSTIC PROBE FOR INTENSE ELECTRON-BEAMS [J].

NASSISI, V ;

LUCHES, A .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1977, 48 (11) :1400-1401

[10]

NATION JA, 1973, APPL PHYS LETT, V32, P429

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