OPTICAL AND ELECTRICAL CHARACTERIZATION OF SI/GE SUPERLATTICES

被引:4
作者
GRIMMEISS, HG [1 ]
NAGESH, V [1 ]
ENGVALL, J [1 ]
OLAJOS, J [1 ]
PRESTING, H [1 ]
KIBBEL, H [1 ]
KASPER, E [1 ]
机构
[1] DAIMLER BENZ AG,FORSCHUNGSZENTRUM,W-7900 ULM,GERMANY
关键词
D O I
10.1016/0040-6090(92)90076-N
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using recent studies of absorption and photoluminescence, different junction space charge techniques have been employed to separate intrinsic signals from extrinsic responses in ultrathin Si/Ge superlattices. The diodes showed good I-V characteristics with ideality factors of about 2 and a reverse current of about 10(-11) A for voltages less than 1 V. The extrinsic photoionization cross-section spectrum exhibited oscillatory properties which are discussed in terms of Wannier-Stark localization.
引用
收藏
页码:237 / 242
页数:6
相关论文
共 13 条
[1]   QUANTUM COHERENCE IN SEMICONDUCTOR SUPERLATTICES [J].
AGULLORUEDA, F ;
MENDEZ, EE ;
HONG, JM .
PHYSICAL REVIEW B, 1989, 40 (02) :1357-1360
[2]   ELECTRIC-FIELD INDUCED LOCALIZATION AND OSCILLATORY ELECTRO-OPTICAL PROPERTIES OF SEMICONDUCTOR SUPERLATTICES [J].
BLEUSE, J ;
BASTARD, G ;
VOISIN, P .
PHYSICAL REVIEW LETTERS, 1988, 60 (03) :220-223
[3]   THERMAL AND OPTICAL GENERATION CURRENT IN REVERSE-BIASED GOLD-DOPED SILICON P+N JUNCTIONS WITHOUT DEPLETION APPROXIMATION [J].
BRAUN, S ;
GRIMMEISS, HG .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (06) :2789-2794
[4]   OPTICAL STUDIES OF SHORT-PERIOD SI/GE SUPERLATTICES BY PHOTOCAPACITANCE [J].
GRIMMEISS, HG ;
NAGESH, V ;
PRESTING, H ;
KIBBEL, H ;
KASPER, E .
PHYSICAL REVIEW B, 1992, 45 (03) :1236-1239
[5]   FUNDAMENTALS OF JUNCTION MEASUREMENTS IN THE STUDY OF DEEP ENERGY-LEVELS IN SEMICONDUCTORS [J].
GRIMMEISS, HG ;
OVREN, C .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1981, 14 (09) :1032-1042
[6]   HIGH-RESOLUTION ABSORPTION-MEASUREMENTS IN GOLD DOPED SI/GE ALLOYS [J].
HELLQVIST, EL ;
NAGESH, V ;
GRIMMEISS, HG ;
KLEVERMAN, M .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1991, 53 (01) :43-46
[7]   HIGH-SPEED INTEGRATED-CIRCUIT USING SILICON MOLECULAR-BEAM EPITAXY (SI-MBE) [J].
KASPER, E ;
WORNER, K .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (10) :2481-2486
[8]   SYMMETRICALLY STRAINED SI/GE SUPERLATTICES ON SI SUBSTRATES [J].
KASPER, E ;
KIBBEL, H ;
JORKE, H ;
BRUGGER, H ;
FRIESS, E ;
ABSTREITER, G .
PHYSICAL REVIEW B, 1988, 38 (05) :3599-3601
[9]  
KASPER E, 1980, THIN SOLID FILMS, V183, P87
[10]   STARK LOCALIZATION IN GAAS-GAALAS SUPERLATTICES UNDER AN ELECTRIC-FIELD [J].
MENDEZ, EE ;
AGULLORUEDA, F ;
HONG, JM .
PHYSICAL REVIEW LETTERS, 1988, 60 (23) :2426-2429