MOLECULAR-BEAM-EPITAXY GAAS REGROWTH WITH CLEAN INTERFACES BY ARSENIC PASSIVATION

被引:48
作者
MILLER, DL
CHEN, RT
ELLIOTT, K
KOWALCZYK, SP
机构
关键词
D O I
10.1063/1.334425
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1922 / 1927
页数:6
相关论文
共 15 条
[1]   TELLURIUM COATING OF PBTE SURFACES [J].
BETTINI, M ;
BRANDT, G ;
ROTTER, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (05) :1548-1553
[2]   INTERFACE AND DOPING PROFILE CHARACTERISTICS WITH MOLECULAR-BEAM EPITAXY OF GAAS - GAAS VOLTAGE VARACTOR [J].
CHO, AY ;
REINHART, FK .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (04) :1812-1817
[3]   ALUMINUM SCHOTTKY-BARRIER FORMATION ON ARSENIC CAPPED AND HEAT CLEANED MBE GAAS(100) [J].
EGLASH, SJ ;
WILLIAMS, MD ;
MAHOWALD, PH ;
NEWMAN, N ;
LINDAU, I ;
SPICER, WE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (03) :481-485
[4]   COMPARATIVE LEED STUDIES OF ALXGA1-XAS(110) AND GAAS(110)-AL(DELTA) [J].
KAHN, A ;
CARELLI, J ;
MILLER, DL ;
KOWALCZYK, SP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (02) :380-383
[5]   CARRIER COMPENSATION AT INTERFACES FORMED BY MOLECULAR-BEAM EPITAXY [J].
KAWAI, NJ ;
WOOD, CEC ;
EASTMAN, LF .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (09) :6208-6213
[6]   ARSENIC PASSIVATION - A POSSIBLE REMEDY FOR MBE GROWTH-INTERRUPTION PROBLEMS [J].
KAWAI, NJ ;
NAKAGAWA, T ;
KOJIMA, T ;
OHTA, K ;
KAWASHIMA, M .
ELECTRONICS LETTERS, 1984, 20 (01) :47-48
[7]   INFLUENCE OF DEEP TRAPS ON MEASUREMENT OF FREE-CARRIER DISTRIBUTIONS IN SEMICONDUCTORS BY JUNCTION CAPACITANCE TECHNIQUES [J].
KIMERLING, LC .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (04) :1839-1845
[8]   PHOTOIONIZATION CROSS-SECTION MEASUREMENTS OF DEEP LEVELS IN IRON DOPED GAAS [J].
KITAHARA, K ;
NAKAI, K ;
OZEKI, M ;
SHIBATOMI, A ;
DAZAI, K .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1976, 15 (11) :2275-2276
[9]   PROTECTION OF MOLECULAR-BEAM EPITAXY GROWN ALXGA1-XAS EPILAYERS DURING AMBIENT TRANSFER [J].
KOWALCZYK, SP ;
MILLER, DL ;
WALDROP, JR ;
NEWMAN, PG ;
GRANT, RW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (02) :255-256
[10]   STUDY OF DEEP LEVELS IN GAAS BY CAPACITANCE SPECTROSCOPY [J].
LANG, DV ;
LOGAN, RA .
JOURNAL OF ELECTRONIC MATERIALS, 1975, 4 (05) :1053-1066