ELLIPSOMETRY OF SILICON WITH NATURAL SURFACE-FILM AT 632.8 NM

被引：10

作者：

LUKES, F

机构：

来源：

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 1986年 / 94卷 / 01期

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D O I：

10.1002/pssa.2210940126

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T [工业技术];

学科分类号：

08 ;

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页码：223 / 230

页数：8

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