TITANIUM DISILICIDE FORMATION BY WIDE-AREA ELECTRON-BEAM IRRADIATION

被引：21

作者：

MOORE, CA

ROCCA, JJ

COLLINS, GJ

RUSSELL, PE

GELLER, JD

机构：

[1] COLORADO STATE UNIV,ENGN RES CTR,FT COLLINS,CO 80523

[2] JAPAN ELECTRON OPT LAB USA,PEABODY,MA 01960

来源：

关键词：

D O I：

10.1063/1.95157

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：169 / 171

页数：3

共 9 条

[1] LUE JT, 1981, APPL PHYS LETT, V38, P372
[2] MAYDELL EA, 1983, NOV MAT RES SOC ANN
[3] LARGE AREA ELECTRON-BEAM ANNEALING
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ROCCA, JJ
JOHNSON, T
COLLINS, GJ
RUSSELL, PE
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (03) : 290 - 292
[4] THIN-FILM INTERACTION BETWEEN TITANIUM AND POLYCRYSTALLINE SILICON
MURARKA, SP
FRASER, DB
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) : 342 - 349
[5] REFRACTORY SILICIDES FOR INTEGRATED-CIRCUITS
MURARKA, SP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (04): : 775 - 792
[6] ROBINSON JW, 1974, CRC HDB SPECTROSCOPY, V1
[7] METAL SILICON REACTIONS INDUCED BY CW SCANNED LASER AND ELECTRON-BEAMS
SHIBATA, T
SIGMON, TW
REGOLINI, JL
GIBBONS, JF
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) : 637 - 644
[8] STULL DR, 1971, JANAF THERMOCHEMICAL, P37
[9] FORMATION OF MOSI2 BY PULSED ELECTRON-BEAM IRRADIATION ONTO A VAPOR-DEPOSITED MOLYBDENUM SILICON STRUCTURE
SUZUKI, S
[J]. APPLIED PHYSICS LETTERS, 1983, 42 (09) : 797 - 799