共 16 条
[1]
Andersen H. H., 1981, Sputtering by particle bombardment I. Physical sputtering of single-element solids, P145
[2]
ION SORPTION IN PRESENCE OF SPUTTERING
[J].
PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON,
1962, 79 (508)
:299-&
[7]
EFFECT OF OXYGEN IMPLANTATION UPON SECONDARY ION YIELDS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1981, 18 (02)
:164-168
[8]
AN AES-SIMS STUDY OF SILICON OXIDATION INDUCED BY ION OR ELECTRON-BOMBARDMENT
[J].
APPLICATIONS OF SURFACE SCIENCE,
1980, 5 (03)
:221-242
[9]
MODEL CALCULATION OF ION COLLECTION IN PRESENCE OF SPUTTERING .1. ZERO ORDER APPROXIMATION
[J].
RADIATION EFFECTS AND DEFECTS IN SOLIDS,
1976, 29 (01)
:31-40
[10]
Warmoltz N., 1980, Surface and Interface Analysis, V2, P46, DOI 10.1002/sia.740020203