EFFECT OF CU DEPOSITION ON STRUCTURAL AND ELECTRONIC-PROPERTIES OF CLEAVED SI(111) SURFACES

被引：24

作者：

TALEBIBRAHIMI, A

MERCIER, V

SEBENNE, CA

BOLMONT, D

CHEN, P

机构：

来源：

SURFACE SCIENCE | 1985年 / 152卷 / APR期

关键词：

D O I：

10.1016/0039-6028(85)90543-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：1228 / 1238

页数：11

共 15 条

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